Habanero

DELTAIR 22H

Accretech’s new bevel etcher

 

“Habanero™”, Accretech’s new bevel etcher, uses FACE™ (Flame Assisted Chemical Etch) technology to remove wafer edge films before delamination. Accretech’s patented technology directs reactive gas to precisely controlled edge regions while simultaneously shielding active device areas from exposure to reaction products. Habanero’s FACE™ process requires no masking or post-process cleaning. It replaces conventional and expensive wet chemistries, abrasive pads, brushes or tapes, and eliminates ion-assisted processes that can induce charge damage.

Process Regions:
Edge exclusion topside or backside (0.3 to 3.0mm from wafer edge)
Bevel topside or backside
Wafer crown
Applications:
Lithography films: Resist, BARC and ARC
Dielectric films: Oxides, Nitrides, Low-Ks and Ultra Low-Ks
Barriers films: TaN, TiN and SiC
Features:
Configurable module system for single or dual chambers
Adjustable process hardware and software for various wafer edge profiles
Optional inline wafer edge inspection system
Low cost of consumables